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Year 2019 Volume 17, Issue 4 |
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Issues/2019/vol. 17 /Issue 4 |
V. I. Grygoruk, V. I. Kanevskyi, S. O. Kolienov
«Analytical Calculation of Conditions for Submicronic Etching of a Flat Surface of Quartz»
637–648 (2019)
PACS numbers: 41.20.Jb, 42.25.Bs, 42.25.Gy, 78.20.Bh, 78.68.+m, 81.16.Rf, 81.65.Cf
An analytical method for calculating of electromagnetic field on the plane quartz surface along the ‘quartz–vacuum’ interface is described. The distribution of field-energy density, if such a surface is illuminated from the quartz side, is shown and analysed for the angle of incidence of the light, which is equal to the critical angle. The following results are obtained: (a) as the phase of the incident wave changes, its maximum-amplitude value (crest) drifts along the ‘quartz–vacuum’ interface and creates optimal conditions for submicron etching; (b) the energy transfer occurs mainly along the interface; (c) the reflected wave is partially penetrates vacuum volume decaying exponentially as it moves away from the interface; (d) as the angle of incidence of the incident wave increases, the active and reactive components of the Poynting’s vector in the region of the evanescent field decrease that worsens the conditions for submicron etching of the surface.
Keywords: surface plasmon resonance, scattering of plane electromagnetic waves, vector Helmholtz equation
https://doi.org/10.15407/nnn.17.04.637
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 This article is licensed under the Creative Commons Attribution-NoDerivatives 4.0 International License © NANOSISTEMI, NANOMATERIALI, NANOTEHNOLOGII G. V. Kurdyumov Institute for Metal Physics of the National Academy of Sciences of Ukraine, 2019 E-mail: tatar@imp.kiev.ua Phones and address of the editorial office About the collection User agreement |