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Year 2019 Volume 17, Issue 2 |
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Issues/2019/vol. 17 /Issue 2 |
O. M. Bordun, I. O. Bordun, I. I. Kukharskyi, I. I. Medvid, Zh. Ia. Tsapovska, D. S. Leonov
«Features of Deposition and Formation of the Structure of Y2O3:Eu Thin Films Obtained by Radio-Frequency Sputtering»
353–360 (2019)
PACS numbers: 34.35.+a, 68.49.Sf, 68.55.Ln, 78.70.Gq, 79.20.Rf, 81.15.Cd, 81.15.Jj
The structure, surface morphology, and features of deposition of thin Y2O3: Eu films with radio-frequency ion-plasma sputtering are studied. The presence of the optimal working-gas pressure, at which the deposition rate of films is maximum, is revealed. Its value is determined by the gas composition and geometrical parameters. The working-gas composition influence on the deposition rate of Y2O3:Eu films is investigated.
Key words: yttrium oxide, thin films, crystallites.
https://doi.org/10.15407/nnn.17.02.353
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