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Year 2022 Volume 20, Issue 1 |
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Issues/2022/vol. 20 /Issue 1 |
O. M. Bordun, I. O. Bordun, I. M. Kofliuk, I. Yo. Kukharskyy, I. I. Medvid, Zh. Ya. Tsapovska, and D. S. Leonov
Surface Morphology of Y2O3:Eu Thin Films at Different Activator Concentrations
0091–0096 (2022)
PACS numbers: 61.05.cp, 61.72.Ff, 61.72.Mm, 68.35.Ct, 68.37.Ps, 68.55. J-, 81.15.Cd
Atomic force microscopy is used to study the surface morphology of thin Y2O3:Eu films obtained by the radio-frequency ion-plasma sputtering with an activator concentration of 1.0, 2.5, and 5 mol.%. Based on the analysis of the obtained results, an almost linear dependence of the sizes of surface structures on the value of the activator concentration and a superlinear increase in both the root-mean-square surface roughness and the average distance between grains are revealed. The obtained results are discussed.
Key words: yttrium oxide, activator, thin films, nanocrystallites.
https://doi.org/10.15407/nnn.20.01.091
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