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2022

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vol. 20 /

Issue 1

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V. I. Kanevskii, S. O. Kolienov, V. I. Grygoruk, and Yu. V. Prokopenko
Optimization of the Task of Determining the Conditions for Effective Photochemical Subnanopolishing of the Rough Surface of the Quartz for Lighting from the Side of the Quartz
0025–0044 (2022)

PACS numbers: 68.35.Ct, 78.20.Ci, 81.16.Rf, 81.65.Cf, 81.65.Ps, 81.70.Fy

The solution of the electrodynamic task for defining the optimal configuration of the evanescent field formed near the rough quartz surface, when lighting from the quartz side that provides effective photochemical polishing of this surface up to a subnanometer level of roughness, is considered. It is found that, for a quartz surface profile in the form of triangular protrusions and troughs, which are periodically repeated, optimal conditions for photochemical polishing are achieved when the angle of light incidence is critical and the height of the surface protrusions is small (up to 20 nm). It is also shown what the criteria are, at which a regular profile in the form of triangular protrusions and troughs can be used as equivalent in defining the optimal field parameters for a random surface profile characterized by the Gaussian correlation function.

Key words: surface plasmon resonance, scattering of plane electromagnetic waves, vector Helmholtz equation, photochemical polishing, evanescent field, total internal reflection

https://doi.org/10.15407/nnn.20.01.025

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