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Year 2017, Volume 15, Issue 4 |
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Issues/2017/Vol. 15 /issue 4 |
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Key words: thin films, Raman spectroscopy, amorphous carbon, plasmon interactions.
https://doi.org/10.15407/nnn.15.04.0757
REFERENCES
1. M. Yu. Barabash, D. O. Hryn'ko, and S. O. Sperkach, Formuvannya Nanostruktur na Templatakh Vyprominyuvannyam iz Vydymoho Diapazonu (Kyiv: IMF NANU: 2015) (in Ukrainian).
2. D. Hohnholz, S. Steinbrecher, and M. Hanack, J. of Molecular Structure, 521: 231 (2000).
https://doi.org/10.1016/S0022-2860(99)00438-X
3. E. Itoh, Yu. Ohmori, and K. Miyairi, Photovoltaic J. of Appl. Phys., 43, No. 2: 817 (2004).
https://doi.org/10.1143/JJAP.43.817
4. A. Ricard, Reactive Plasmas (Paris: SVF: 1996), p. 176.
5. V. P. Maishev and S. L. Shevchuk, International Conference Plasma Physics and Plasma Technology Contributed Papers (ICPPPT-2003) (Minsk, Belarus: 2003), vol. 1, p. 483.
6. Yu. A. Gerasimov, T. A. Gracheva, and Yu. A. Lebedeva, Ehksperimental'nye i Teoreticheskie Issledovaniya Plazmokhimicheskikh Processov (Moscow: 1984) p. 68 (in Russian).
7. Yu. A. Ivanov, Institut Neftekhimicheskogo Sinteza AN SSSR. Sintez v Nizkotemperaturnoy Plazme (Moscow: 1980), p. 24 (in Russian).
8. Yu. A. Ivanov, N. M. Rytova, V. N. Timakin, and I. L. Ehpshtein, Institut Neftekhimicheskogo Sinteza AN SSSR. Plazmokhimiya (Moscow: 1988), p. 90 (in Russian).
9. J. Yancha, Institut Neftekhimicheskogo Sinteza AN SSSR. Plazmokhimiya, (Moscow: 1989) p. 64 (in Russian).
10. Yu. A. Ivanov, N. M. Rytova, I. V. Soldatova, V. N. Timakin, and I. L. Ehpshtein, Institut Neftekhimicheskogo Sinteza AN SSSR. Plazmokhimiya (Moscow: 1991), vol. 1, p. 172 (in Russian).
11. A. P. Semenov, Puchki Raspylyayushchikh Ionov: Poluchenie i Primenenie (Ulan Ude: BNC SO RAN: 1999) (in Russian).
12. A. F. Beljanin, A. P. Semenov, and I. A. Semenova, Almazy v Tekhnike i Ehlektronike: Trudy Mezhdunarodnoi Konferentsii (Moscow: POLARON: 1998) (in Russian).
13. I. A. Semenova, Avtoref. Dis. na Soiskanie Uchyonoi Stepeni Kandidata Tekhnicheskikh Nauk (Ulan Ude: BNC SO RAN: 2002) (in Russian).
14. J. J. Cuomo, D. L. Pappas et al., J. of Appl. Phys., 70, Iss. 3: 1706 (1991).
https://doi.org/10.1063/1.349540
15. D. R. McKenzie, D. Muller, and B. A. Pailthorpe, Phys. Rev. Lett., 67, Iss. 5-6: 773 (1991).
https://doi.org/10.1103/PhysRevLett.67.773
16. M. Iu. Barabash and D. O. Hrynko, Nanosistemi, Nanomateriali, Nanotehnologii, 10, No. 3: 595 (2012) (in Ukrainian).
17. M. L. Orlov, V. E. Kochurikhin, S. S. Gerasimovich, V. V. Sleptsov, and V. M. Ehlinson, Poverhnost', Fizika, Khimiya, Mekhanika, 6: 65 (1989) (in Russian).
18. C. Oppedisano and A. Tagliaferro, Appl. Phys. Letters, 75: 3650 (1999).
https://doi.org/10.1063/1.125417
19. L. V. Lutsev, S. V. Yakovlev, and V. I. Siklitskii, Fizika Tverdogo Tela, 42, No. 6: 1105 (2000) (in Russian).
https://doi.org/10.1134/1.1131330
20. V. I. Ivanov-Omskii, T. K. Zvonareva, and G. F. Frolova, Fizika Tverdogo Tela, 41, No. 2: 319 (1999) (in Russian).
https://doi.org/10.1134/1.1130769
21. R. G. Lacedra and F. C. Marques, Appl. Phys. Let., 73: 617 (1998).
https://doi.org/10.1063/1.121874
22. S. Sattel, J. Robertson, and H. Ehrhardt, J. of Appl. Phys., 82: 4566 (1997).
https://doi.org/10.1063/1.366193
23. M. Chhowalla, J. Robertson, R. S. P. Silva, G. A. J. Amaratunga, W. I. Milne, and J. Koskineen, J. of Appl. Phys., 81: 139 (1997).
https://doi.org/10.1063/1.364000
24. J. Robertson, Diam. Rel. Mat., 397 (1992).
https://doi.org/10.1016/0925-9635(92)90137-D
25. A. C. Ferrari and J. Robertson, Phys. Rev. B, 61, No. 20: 14095 (2000).
https://doi.org/10.1103/PhysRevB.61.14095
26. Yu. Liu, C. Pan, and J. Wang, J. of Materials Science, 39: 1091 (2004).
https://doi.org/10.1023/B:JMSC.0000012952.20840.09
27. P. C. Eklud, J. M. Holden, and R. A. Jishi, Carbon, 33: 959 (1995).
https://doi.org/10.1016/0008-6223(95)00035-C
28. T. N. Vasilevskaya, S. G. Yastrebov, N. S. Andreev, I. A. Drozdova, T. K. Zvonareva, and V. N. Filipovich, Fizika Tverdogo Tela, 41, No. 11: 2088 (1999) (in Russian).
https://doi.org/10.1134/1.1131127
29. A. C. Ferrari, B. Kleinsorge, G. Adamopoulos, J. Robertson, W. I. Milne, V. Stolojan, L. M. Brown, and A. Libassi, J. Non-Cryst. Solids, 266-269: 765 (2000).
https://doi.org/10.1016/S0022-3093(00)00035-1
30. N. F. Mott and E. A. Davis, Electronic Process in Non-Crystalline Materials (Oxford: Clarendon: 1979), p. 255.
M. Yu. Barabash, A. A. Kolesnichenko, and D. S. Leonov
«Spectroscopy of Amorphous Carbon on the Glass Substrate and on the Thin Copper Layer»
757–769 (2017)
PACS numbers: `33.20.Fb, 61.43.Er, 78.30.Na, 78.66.Tr, 81.05.U-, 81.15.-z, 81.16.Rf
In this work, the optical properties of thin carbon films obtained by the thermal spraying on the surface of a glass substrate and on the surface of a thin copper layer are studied. The structure and stoichiometry of fabricated films are investigated using the Raman spectroscopy. The Raman spectra of surface samples obtained under different deposition regimes are presented.
Key words: thin films, Raman spectroscopy, amorphous carbon, plasmon interactions.
https://doi.org/10.15407/nnn.15.04.0757
REFERENCES
1. M. Yu. Barabash, D. O. Hryn'ko, and S. O. Sperkach, Formuvannya Nanostruktur na Templatakh Vyprominyuvannyam iz Vydymoho Diapazonu (Kyiv: IMF NANU: 2015) (in Ukrainian).
2. D. Hohnholz, S. Steinbrecher, and M. Hanack, J. of Molecular Structure, 521: 231 (2000).
https://doi.org/10.1016/S0022-2860(99)00438-X
3. E. Itoh, Yu. Ohmori, and K. Miyairi, Photovoltaic J. of Appl. Phys., 43, No. 2: 817 (2004).
https://doi.org/10.1143/JJAP.43.817
4. A. Ricard, Reactive Plasmas (Paris: SVF: 1996), p. 176.
5. V. P. Maishev and S. L. Shevchuk, International Conference Plasma Physics and Plasma Technology Contributed Papers (ICPPPT-2003) (Minsk, Belarus: 2003), vol. 1, p. 483.
6. Yu. A. Gerasimov, T. A. Gracheva, and Yu. A. Lebedeva, Ehksperimental'nye i Teoreticheskie Issledovaniya Plazmokhimicheskikh Processov (Moscow: 1984) p. 68 (in Russian).
7. Yu. A. Ivanov, Institut Neftekhimicheskogo Sinteza AN SSSR. Sintez v Nizkotemperaturnoy Plazme (Moscow: 1980), p. 24 (in Russian).
8. Yu. A. Ivanov, N. M. Rytova, V. N. Timakin, and I. L. Ehpshtein, Institut Neftekhimicheskogo Sinteza AN SSSR. Plazmokhimiya (Moscow: 1988), p. 90 (in Russian).
9. J. Yancha, Institut Neftekhimicheskogo Sinteza AN SSSR. Plazmokhimiya, (Moscow: 1989) p. 64 (in Russian).
10. Yu. A. Ivanov, N. M. Rytova, I. V. Soldatova, V. N. Timakin, and I. L. Ehpshtein, Institut Neftekhimicheskogo Sinteza AN SSSR. Plazmokhimiya (Moscow: 1991), vol. 1, p. 172 (in Russian).
11. A. P. Semenov, Puchki Raspylyayushchikh Ionov: Poluchenie i Primenenie (Ulan Ude: BNC SO RAN: 1999) (in Russian).
12. A. F. Beljanin, A. P. Semenov, and I. A. Semenova, Almazy v Tekhnike i Ehlektronike: Trudy Mezhdunarodnoi Konferentsii (Moscow: POLARON: 1998) (in Russian).
13. I. A. Semenova, Avtoref. Dis. na Soiskanie Uchyonoi Stepeni Kandidata Tekhnicheskikh Nauk (Ulan Ude: BNC SO RAN: 2002) (in Russian).
14. J. J. Cuomo, D. L. Pappas et al., J. of Appl. Phys., 70, Iss. 3: 1706 (1991).
https://doi.org/10.1063/1.349540
15. D. R. McKenzie, D. Muller, and B. A. Pailthorpe, Phys. Rev. Lett., 67, Iss. 5-6: 773 (1991).
https://doi.org/10.1103/PhysRevLett.67.773
16. M. Iu. Barabash and D. O. Hrynko, Nanosistemi, Nanomateriali, Nanotehnologii, 10, No. 3: 595 (2012) (in Ukrainian).
17. M. L. Orlov, V. E. Kochurikhin, S. S. Gerasimovich, V. V. Sleptsov, and V. M. Ehlinson, Poverhnost', Fizika, Khimiya, Mekhanika, 6: 65 (1989) (in Russian).
18. C. Oppedisano and A. Tagliaferro, Appl. Phys. Letters, 75: 3650 (1999).
https://doi.org/10.1063/1.125417
19. L. V. Lutsev, S. V. Yakovlev, and V. I. Siklitskii, Fizika Tverdogo Tela, 42, No. 6: 1105 (2000) (in Russian).
https://doi.org/10.1134/1.1131330
20. V. I. Ivanov-Omskii, T. K. Zvonareva, and G. F. Frolova, Fizika Tverdogo Tela, 41, No. 2: 319 (1999) (in Russian).
https://doi.org/10.1134/1.1130769
21. R. G. Lacedra and F. C. Marques, Appl. Phys. Let., 73: 617 (1998).
https://doi.org/10.1063/1.121874
22. S. Sattel, J. Robertson, and H. Ehrhardt, J. of Appl. Phys., 82: 4566 (1997).
https://doi.org/10.1063/1.366193
23. M. Chhowalla, J. Robertson, R. S. P. Silva, G. A. J. Amaratunga, W. I. Milne, and J. Koskineen, J. of Appl. Phys., 81: 139 (1997).
https://doi.org/10.1063/1.364000
24. J. Robertson, Diam. Rel. Mat., 397 (1992).
https://doi.org/10.1016/0925-9635(92)90137-D
25. A. C. Ferrari and J. Robertson, Phys. Rev. B, 61, No. 20: 14095 (2000).
https://doi.org/10.1103/PhysRevB.61.14095
26. Yu. Liu, C. Pan, and J. Wang, J. of Materials Science, 39: 1091 (2004).
https://doi.org/10.1023/B:JMSC.0000012952.20840.09
27. P. C. Eklud, J. M. Holden, and R. A. Jishi, Carbon, 33: 959 (1995).
https://doi.org/10.1016/0008-6223(95)00035-C
28. T. N. Vasilevskaya, S. G. Yastrebov, N. S. Andreev, I. A. Drozdova, T. K. Zvonareva, and V. N. Filipovich, Fizika Tverdogo Tela, 41, No. 11: 2088 (1999) (in Russian).
https://doi.org/10.1134/1.1131127
29. A. C. Ferrari, B. Kleinsorge, G. Adamopoulos, J. Robertson, W. I. Milne, V. Stolojan, L. M. Brown, and A. Libassi, J. Non-Cryst. Solids, 266-269: 765 (2000).
https://doi.org/10.1016/S0022-3093(00)00035-1
30. N. F. Mott and E. A. Davis, Electronic Process in Non-Crystalline Materials (Oxford: Clarendon: 1979), p. 255.
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