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O. I. BARCHUK, K. S. BILENKO, A. A. GOLOBOROD’KO, V. N. KURASHOV, E. A. OBEREMOK, and S. N. SAVENKOV
«Impact of Polysilicon Films Structure on Optical Characteristics of Reflected Light »
421–431 (2009)
PACS numbers: 07.60.Hv, 42.25.Gy, 68.35.bg, 68.55.J-, 68.65.Ac, 78.67.Pt, 81.70.Fy
Optical characteristics of complex multilayer systems based on Si are studied. Influence of polysilicon-films structure with nanoscale features on behaviour of angular dependences for reflection coefficients, Rp and Rs, are investigated. As shown, the multiple-scattering model for multilayered structure could be used for interpretation of obtained experimental results. Absorption in such media and averaging over photodetector aperture should be taken into account at calculation. As shown in computer simulation, the presence of SiO2 layer on a substrate essentially changes behaviour of reflection-coefficients dependences. Presence of additional extremums on dependences is conditioned by the presence of interfering waves, which are reflected from boundaries with different refractive indexes for the system ‘air–polysilicon film–oxide–silicon–substrate’.
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