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1Al-Qasim Green University, Al-Qasim District, Babylon Governorate, 51013 Babylon, Iraq
2College of Materials Engineering, Ceramic and Building Materials Department, University of Babylon, Hillah, Iraq
3College of Engineering, Department of Prosthetics and Orthotics Engineering, Al-Nahrain University, Jadriya, Baghdad, Iraq
4Faculty of Engineering and Built Environment, Department of Civil Engineering, Universiti Kebangsaan Malaysia, 43600 UKM Bangi, Selangor, Malaysia
5Imam Ja'afar Al-Sadiq University, Qahira, Baghdad, Iraq

High Optical Transmittance of TiO2 Thin Films Prepared by Sol–Gel Coating Technique

719–732 (2025)

PACS numbers: 78.20.Ci, 78.20.Jq, 78.40.Ha, 78.66.Li, 78.67.Bf, 81.20.Fw, 81.40.Tv

In this paper, thin titanium-dioxide films are prepared with sol–gel processing, and the effect of annealing-temperature variations on some optical properties (n, k, d) is investigated. Thin films are determined using the ellipsometry technique, considering the effect of annealing temperatures of 360°C, 460°C, 550°C, and 700°C. By using a spectrophotometer (UV–Vis), the optical properties are determined. As found, the best values of optical transmittance are obtained for the annealed film at 500°C (the spectrophotometric curve at issue is showing the largest transmittance of the visible length, reaching between 80% and 90% at wavelengths ranging from 400 nm to 600 nm, respectively). The best values of reflectance and refractive index appear at T ≈ 460°C and T ≈ 500°C, as the films show low reflectance values in the visible region 400–700 nm. It should be noted that the annealed film at a temperature of 500°C is the best. All films have a wide band gap of 3.2 eV as obtained for all samples prepared, especially, at T ≈ 500°C.

KEY WORDS: sol–gel processing, thin films, optical transmittance

DOI: https://doi.org/10.15407/nnn.23.03.0719

Citation:
Fouad Zuhair Razzooqi, Mohammed S. Radhi, Hayder Abbas Sallal, and Zainab Al-Khafaji, High Optical Transmittance of TiO2 Thin Films Prepared by Sol–Gel Coating Technique, Nanosistemi, Nanomateriali, Nanotehnologii, 23, No. 3: 719–732 (2025); https://doi.org/10.15407/nnn.23.03.0719
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