Download the full version of the article (in PDF format)
Î. Ì. Bordun, B. Î. Bordun, I. Yo. Kukharskyy, I. I. Medvid, D. Ì. Maksymchuk, Zh. Ya. Tsapovska, and D. S. Leonov
Photoconductivity of Thin β-Ga2O3 and β-Ga2O3:Cr3+ Films
0049–0055 (2023)
PACS numbers: 61.72.jn, 68.55.jd, 73.50.Pz, 73.61.Ng, 78.55.-m, 81.15.Gh, 81.40.Tv
The presence of photoconductivity in thin films of β-Ga2O3 and β-Ga2O3:Cr3+ obtained by radio-frequency (RF) ion-plasma sputtering after heat treatment in air has been established. The obtained photoconductivity spectra are analysed, and it is shown that the photoconductivity in pure thin β-Ga2O3 films is due to intrinsic photoconductivity because of the band–gap electronic transitions. In thin β-Ga2O3:Cr3+ films, in addition to this photoconductivity band, there are also three photoconductivity bands observed due to electronic transitions within the Cr3+ activator ion. At the same time, all three excited levels fall into the conduction band and lead to the appearance of U-, Y-, and V-bands of photoconductivity.
Key words: gallium oxide, thin films, activator, photoconductivity.
https://doi.org/10.15407/nnn.21.01.049
References
- K. Matsuzaki, H. Yanagi, T. Kamiya, H. Hiramatsu, K. Nomura, M. Hirano, and H. Hosono, Appl. Phys. Lett., 88, No. 9: 092106 (2006); https://doi.org/10.1063/1.2179373
- N. D. Cuong, Y. W. Park, and S. G. Yoon, Sensors and Actuators B, 140, No. 1: 240 (2009); https://doi.org/10.1016/j.snb.2009.04.020
- M. Orita, H. Ohta, M. Hirano, and H. Hosono, Appl. Phys. Lett., 77, No. 25: 4166 (2000); https://doi.org/10.1063/1.1330559
- J.-G. Zhao, Z.-X. Zhang, Z.-W. Ma, H.-G. Duan, X.-S. Guo, and E.-Q. Xie, Chinese Phys. Lett., 25, No. 10: 3787 (2008); https://doi.org/10.1088/0256-307X/25/10/073
- Y. Tokida and S. Adachi, Jpn. J. Appl. Phys., 52, No. 10R: 101102 (2013); https://doi.org/10.7567/JJAP.52.101102
- P. Wellenius, A. Suresh, J. V. Foreman, H. O. Everitt, and J. F. Muth, Mater. Sci. Eng. B, 146: 252 (2008); https://doi.org/10.1016/j.mseb.2007.07.060
- T. Minami, T. Shirai, T. Nakatani, and T. Miyata, Jpn. J. Appl. Phys., 39, No. 6A: L524 (2000); https://doi.org/10.1143/JJAP.39.L524
- M. Alonso-Orts, E. Nogales, J. M. San Juan, M. L. No, J. Piqueras, and B. Mendez, Phys. Rev. Applied, 9, No. 6: 064004 (2018); https://doi.org/10.1103/PhysRevApplied.9.064004
- A. Luchechko, V. Vasyltsiv, L. Kostyk, O. V. Tsvetkova, and B. V. Pavlyk, J. Phys. Stud., 23, No. 3: 3301 (2019); https://doi.org/10.30970/jps.23.3301
- C. Remple, L. M. Barmore, J. Jesenovec, J. S. McCloy, and M. D. McCluskey, J. Vac. Sci. Technol. A, 41, No. 2: 022702 (2023); https://doi.org/10.1116/6.0002340
- V. M. Kalygina, A. N. Zarubin, V. A. Novikov, Yu. S. Petrova, O. P. Tolbanov, A. V. Tyazhev, S. Yu. Tsupiy, and T. M. Yaskevich, Semiconductors, 47, No. 5: 612 (2013); https://doi.org/10.1134/S1063782613050126
- Y. Kokubun, K. Miura, F. Endo, and Sh. Nakagomi, Appl. Phys. Lett., 90, No. 3: 031912 (2007); https://doi.org/10.1063/1.2432946
- J. Hao and M. Cocivera, J. Phys. D: Appl. Phys., 35, No. 5: 433 (2002); https://doi.org/10.1088/0022-3727/35/5/304
- Y. Wei, Y. Jinliang, W. Jiangyan, and Zh. Liying, J. Semicond., 33, No. 7: 073003 (2012); https://doi.org/10.1088/1674-4926/33/7/073003
- K. Wasa, M. Kitabatake, and H. Adachi, Thin Film Materials Technology. Sputtering of Compound Materials (William Andrew, Inc.: 2004).
- O. M. Bordun, B. O. Bordun, I. J. Kukharskyy, I. I. Medvid, Zh. Ya. Tsapovska, and D. S. Leonov, Nanosistemi, Nanomateriali, Nanotehnologii, 15, Iss. 2: 299 (2017); https://doi.org/10.15407/nnn.15.02.0299
- W. Sinkler, L. D. Marks, D. D. Edwards, T. O. Mason, K. R. Poeppelmeier, Z. Hu, and J. D. Jorgensen, J. Solid. State Chem., 136, No. 1: 145 (1998); https://doi.org/10.1006/jssc.1998.7804
- V. I. Vasyltsiv, Ya. I. Rym, Ya. M. Zakharko, phys. status solidi (b), 195, No. 2: 653 (1996); https://doi.org/10.1002/pssb.2221950232
- T. V. Blank and Yu. A. Gol’dberg, Semiconductors, 41, No. 11: 1263 (2007); https://doi.org/10.1134/S1063782607110012
- O. M. Bordun, V. G. Bihday, and I. Yo. Kukharskyy, J. Appl. Spectrosc., 80, No. 5: 721 (2013); https://doi.org/10.1007/s10812-013-9832-2
- T. Oishi, K. Harada, Yu. Koga, and M. Kasu, Jpn. J. Appl. Phys., 55, No. 3: 030305 (2016); https://doi.org/10.7567/JJAP.55.030305
- Sh. Ohira, N. Suzuki, N. Arai, M. Tanaka, T. Sugawara, K. Nakajima, and T. Shishido, Thin Solid Films, 516, No. 17: 5763 (2008); https://doi.org/10.1016/j.tsf.2007.10.083
- O. M. Bordun, B. O. Bordun, I. Yo. Kukharskyy, I. I. Medvid, I. S. Zvizlo, and D. S. Leonov, Nanosistemi, Nanomateriali, Nanotehnologii, 17, Iss. 3: 483 (2019); https://doi.org/10.15407/nnn.17.03.483
- O. M. Bordun, I. Yo. Kukharskyy, I. I. Medvid, D. M. Maksymchuk, F. O. Ivashchyshyn, D. Calus, and D. S. Leonov, Nanosistemi, Nanomateriali, Nanotehnologii, 20, Iss. 2: 321 (2022); https://doi.org/10.15407/nnn.20.02.321
- O. M. Bordun, B. O. Bordun, I. Yo. Kukharskyy, and I. I. Medvid, J. Appl. Spectrosc., 84, No. 1: 46 (2017); https://doi.org/10.1007/s10812-017-0425-3
- O. M. Bordun, I. Yo. Kukharskyy, B. O. Bordun, V. B. Lushchanets, J. Appl. Spectrosc., 81, No. 5: 771 (2014); https://doi.org/10.1007/s10812-014-0004-9
- S. K. Sampath and J. F. Cordaro, J. Am. Ceram. Soc., 81, No. 3: 649 (1998); https://doi.org/10.1111/j.1151-2916.1998.tb02385.x
- F. Litimein, D. Rached, R. Khenata, and H. Baltache, J. Alloys Comp., 488, No. 1: 148 (2009); https://doi.org/10.1016/j.jallcom.2009.08.092
- M. Michling and D. Schmeiß, IOP Conf. Ser.: Mater. Sci. Eng., 34: 012002 (2012); https://doi.org/10.1088/1757-899X/34/1/012002
- D. T. Sviridov, R. K. Sviridova, and Yu. F. Smirnov, Opticheskie Spektry Ionov Perekhodnykh Metallov v Kristallakh [Optical Spectra of Transition Metal Ions in Crystals] (Moskva: Nauka: 1976) (in Russian).
|