Collection of scientific works Nanosystems, nanomaterials, nanotechnologies Year 2022 Volume 20, Issue 3
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Î. Ì. Bordun, ². Î. Bordun, ². Ì. Kofliuk, ². Yo. Kukharskyy, ². ². Medvid, ². Ì. Kravchuk, M. S. Karkulovska, and D. S. Leonov
Deposition of Thin Y2O3:Eu Films by Radio-Frequency Sputtering
0639–0645 (2022)

PACS numbers: 61.72.J-, 68.55.Ln, 72.20.Jv, 78.60.Hk, 81.15.Cd, 81.15.Jj, 82.80.Yc

The dependence of the deposition rate of thin Y2O3:Eu films during RF sputtering on the pressure and composition of the working gas is studied. The presence of the optimal pressure of the working gas, at which the deposition rate is maximal, is established. The influence of the Eu3+-activator concentration on the deposition rate of thin films and the brightness of cathodoluminescence of thin Y2O3:Eu films is studied. The explanation of the obtained results is carried out within the limits of backscattering and back-diffusion effects, and special attention is paid to the resonant charge-exchange mechanism.

Key words: yttrium oxide, thin films, radio-frequency sputtering, cathodoluminescence.

https://doi.org/10.15407/nnn.20.03.639

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