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В. В. Лизунов, Е. В. Кочелаб, Е. С. Скакунова, Е. Г. Лень, В. Б. Молодкин, С. И. Олиховский, Н. Г. Толмачёв, Б. В. Шелудченко, С. В. Лизунова, Л. Н. Скапа
«Дисперсионная чувствительность картины рассеяния к дефектам в зависимости от толщины кристаллических изделий нанотехнологий. II. Численный эксперимент »
349–370 (2015)

PACS numbers: 07.85.Jy, 61.05.cc, 61.05.cf, 61.05.cp, 61.46.Hk, 61.72.Dd, 68.55.jd

Based on generalized model of dispersion-sensitive diffractometry constructed in the first part for imperfect crystals of arbitrary thickness, the analysis of differential and integral scattering patterns for a wide range of effective thickness of the crystal is carried out. The dispersion nature and quantitative features of change in the relative contribution of diffuse scattering (DS) managed by diffraction conditions, in particular, depending on the effective thickness of the dynamically scattering imperfect single crystal, are determined. The possibility of a significant increase of information value and sensitivity to defects of the dynamical diffraction due to the increasing of the DS contribution is demonstrated. As shown, the ultimate information value and sensitivity to defects due to the growth of mentioned contribution are observed at intermediate values of the effective thickness of the crystal. Practical recommendations for the choosing of optimal combinations of dynamical diffraction conditions and different (integral and differential) methods are proposed. They provide a solution of the inverse problem of recovering the multiparameter settings of complex defect structures in monocrystalline products of modern nanotechnology.