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В. Брык, Р. Василенко, В. Н. Воеводин, А. Гончаров, Т. Григорова, А. Гугля, В. Колобродов, М. Литвиненко, И. Марченко, Е. Мельникова, И. Сасса, Ю. Никитенко*, Ю. Хайдуков*, В. Волков**, G. Chaboussant***
«Микропористые нанокристаллические тонкие плёнки V–N–He. Способ получения, структура, свойства.»
175–188 (2011)

PACS numbers: 61.43.Gt, 61.80.Jh, 68.37.Hk, 68.43.Mn, 68.55.Ln, 81.15.Jj, 82.80.Yc

In a given paper, we study the main characteristics of V–N–He thin-film formation under condition of high-energy mixed-ion (N, He) beam bombardment. The structural-phase, electrophysi-cal, and adsorption characteristics are studied using differ-ent methods. The data of electron microscopy analysis prove that the V–N–He film structure formation occurs under rivalry conditions of several simultaneously running processes, which lead to formation of microporous structure with pore size of 5 nm to 5 ?m. Role of ion bombardment and gas adsorption from re-sidual atmosphere in porosity formation is discussed. Using the Rutherford backscattering and prophylometry data, the value of porosity of 27% is determined. In the interval of pressure lower than 0.35 MPa, 7 wt.% H2 is absorbed by these films. As shown, the quantity of adsorbed hydrogen is deter-mined by structure of micropores and gas content in films.