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A. A. KUZIN, A. V. ZABLOTSKIY, A. S. BATURIN, D. A. LAPSHIN, P. N. MELENT’EV, and V. I. BALYKIN
«Method for Production of Microlenses Less Than 50 nm in Diameter for Nanolithography Using Atomic Projective Optics»
163–168 (2009)

PACS numbers: 37.25.+k, 81.15.Hi, 81.15.Jj, 81.16.Nd, 81.16.Rf, 85.65.+h

The method is suggested for fabrication of the array of microlenses on Si3N4 membrane with the thickness of 40 nm, which are intended for atomic projective nanolithography. Conductive film with the thickness of 30 nm, which prevents substrate charging, is deposited on the membrane. Such a charging results in a beam widening. Then a focused ion beam burns orifices. After that, orifices are overgrown to a required diameter by electron-beam-assisted deposition of carbon-bearing compounds from residual camera gases. The minimal diameter of the obtained microlenses is 20 nm.