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A. V. KOSTANOVSKIY, L. A. ZHILYAKOV, A. A. PRONKIN, and A. D. KIRILLIN
«Production of Thin Diamond Films by Magnetron Sputtering of Graphite Target»
911–917 (2008)

PACS numbers: 61.46.Bc, 61.48.De, 61.80.Ba, 73.61.Wp, 78.30.Na, 81.05.Uw, 81.15.Cd

Technique of fabrication of the diamond-like films (DLF) by graphite-target magnetron sputtering is presented. To activate the process of DLF formation, radiation of hot filament of high-melting metal located near the substrate is used. Results on optimization of thin-film deposition process parameters are presented. The Raman spectroscopy method shows that the spectrum identifies films as DLF. Thickness of films is 2000 ?, and deposition rate is 200 ?/min. Films are optically transparent, and their conductivity corresponds to semiconductors.